Surface modification of silicon (100) surfaces, and characterization using sum frequency generation spectroscopy (SFG), x-ray photoelectron spectroscopy (XPS), and contact angle goniometry.
Author ORCID
Abstract
Elucidating the fundamental principles of the surface chemistry of silicon (100) modified surfaces is vital because of its widespread application in semiconductor technology.
Status
Graduate
Department
Chemistry & Biochemistry
College
College of Arts and Sciences
Campus
Athens
Faculty Mentor
Dr. Katherine Cimatu
Creative Commons License
This work is licensed under a Creative Commons Attribution-NonCommercial-No Derivative Works 4.0 International License.
COinS
Surface modification of silicon (100) surfaces, and characterization using sum frequency generation spectroscopy (SFG), x-ray photoelectron spectroscopy (XPS), and contact angle goniometry.
Elucidating the fundamental principles of the surface chemistry of silicon (100) modified surfaces is vital because of its widespread application in semiconductor technology.